Ceramic infrared heater panel

Sun, 28 Jun 2026 01:25:31 +0800

On the wafer floor, the soft bake temperature profile is what locks in the photoresist critical dimension and sidewall profile. A half-degree drift will print a line-width excursion that carries straight through the etch. We built our ceramic infrared heater panel to take that variability out of the equation. The core is a high-emissivity ceramic element paired with short-wave infrared, so you get rapid, direct-coupled heating with minimal thermal mass. Across the chuck, wafer-level uniformity holds ±0.1°C, and setpoint repeatability stays within ±0.2°C, even running 24/7. And it holds up in Class 1–100 cleanrooms. The sealed ceramic surface and low-outgassing materials keep particle counts in check, with zero particle generation during ramps and soaks. The response is fast—millisecond-class control—so you can hit tight thermal budgets for soft bake and hard bake without overshoot. Whether it’s lithography tracks or stand-alone bake stations, that thermal discipline translates into stable CD control, fewer photoresist defects, and predictable etch selectivity. You get faster bake cycles without sacrificing profile integrity, lower energy draw from the efficient infrared coupling, and fewer maintenance interruptions. Run-to-run and lot-to-lot, the thermal waveform stays repeatable, so the process window opens up where you need it. Just plan for the practical constraints. The panel needs matched, low-thermal-mass fixtures and a clean electrical feedthrough to keep the thermal loop intact. Installation tolerances are tight—within 0.1 mm—and you have to pick thermal interface materials for outgassing control. Get the alignment right, and the panel drops cleanly into existing tracks and bake tools, delivering the temperature control your lithography and etch processes are asking for.

Panel on Patio Infrared Heating Masters

Ceramic infrared heater panel